Button 1 Button 2 Button 3 Button 4


AFS Horizontal Furnace
AFS Vertical Furnace
AFS Furnace control systems
Furnace related parts

ESC sputter systems

  AFS Horizontal Furnace

AFS Furnace advantage
Outstanding performance, reduced manufacturing costs and improved overall yields

  1. A small footprint saves up to 30% of clean room space
  2. Superior process uniformity
  3. Stable control system and user friendly operation interface
  4. Energy saving

AFS Horizontal furnace configuration
AFS furnace offers great value to the small, medium and large silicon wafer manufacturer.
The systems are available in various sizes and configuration as described in the table below.

AFS furnace applications
AFS Furnace systems can be used for all AP and LPCVD processes employed in the semiconductor industry, including:

    • Dry and wet thermal Oxides
    • Drive in diffusion furnace
    • Alloy anneal furnace
    • LPCVD Low Stress Poly-Silicon Films
    • LPCVD System for Low Strain Si3N4 Films
    • HTO films deposition
    • LTO films deposition


●Advanced Furnace Systems Corp.
●Add : 3F.-2, No.19, Nanke 3rd Rd., Sinshih Township, Tainan County 744, Taiwan (R.O.C.)
●E-mail: cmchu.afs@msa.hinet.net
●Tel : +886-6-505-3705 Ext : 10
●Fax :+886-6-505-3711