弗侖斯系統股份有限公司

．微影製程技術
．濕式製程技術
．薄膜製程技術
．乾蝕刻製程技術
．製程分析設備

微影製程技術

◆6吋自動光阻顯影生產線機台:DNS DA-60A 製程: 光阻顯影 • Substrate size: 6" • Coating of Positive resists : 10 μm to 25 μm. • Coating of positive resists, including soft bake. • Uniformity: < ± 5% within wafer • Capacity: 10k pieces/month
◆6吋自動光阻顯影生產線機台:DNS DA-60A 製程: 光阻顯影 • Substrate size: 6" • Development of positive resists, including hard bake. • Coating of positive resists, including soft bake. • Uniformity: < ± 5% within wafer • Capacity: 10k pieces/month
◆6吋自動絕緣層(P.I. or BCB)塗佈及顯影生產線機台:DNS SKW-636 製程: BCB塗佈 • Substrate size: 6” • Coating of ILD : 3 μm to 10 μm. • Coating of ILD, including developer. • Uniformity: < ± 5% within wafer • Capacity: 10k pieces/month
◆全自動曝光機機台:Karl Suss Mask Aligner MA200 製程: 光阻曝光 •Substrate size: 6". • CD 2 μm, Overlay ± 2um (Topside) • Expose mode: Soft contact, proximity expose possible • Capacity: 10k pieces/month

可靠的製程品質、有競爭力的代工價格、有競爭力的產品 -弗侖斯系統 - 您可以信賴的代工夥伴!
●Advanced Furnace Systems Corp.
●SOUTHERN TAIWNA SCENCE PARK
●Add : 3F.-2, No.19, Nanke 3rd Rd., Sinshih Township, Tainan County 744, Taiwan (R.O.C.)
●E-mail: cmchu.afs@msa.hinet.net
●Tel : +886-6-505-3705 Ext : 10
●Fax :+886-6-505-3711